TSMC is planning to adopt double patterning extensively at 20nm, despite the high cost of doing so. Why? Because EUV hasn't come through. Share on Facebook (opens in a new window) Share on X (opens in ...

Share and share alike! Our mothers always said it was the right thing to do, and it seems that this ideology is now coming front and center for double patterning at 20nm and below. As we continue to ...

Double patterning is a class of technologies developed for photolithography to enhance the feature density of computer chips. The resolution of a photoresist pattern begins to blur at around 45 nm ...

BELMONT, Calif.--(BUSINESS WIRE)--Nikon Corporation has announced they will provide an immersion scanner for Double Patterning, based on the successful NSR-S610C platform, to their customers in the ...

Double patterning (DP), as the simplest form of multi-patterning techniques, is receiving lots of attention right now. The need for double patterning techniques is driven by the physical limits of the ...

The big joke about extreme ultraviolet (EUV) technology is that it takes seven trucks to deliver the mammoth tools compared to one for other advanced lithography tools — but actually, this is no joke.